Analysis of Effect of Deposition Parameters on Thickness of Co-sputtered Titanium/Alumina Thin Film Using ANOVA

Authors

  • Naveen A Department of Mechanical Engineering, Vidyavardhaka College of Engineering, Mysuru, Karnataka, India, 8884404712
  • L KRISHNA MURTHY Department of Mechanical Engineering, National Institute of Engineering, Mysuru, Karnataka, India
  • T N SHRIDHAR Department of Mechanical Engineering, National Institute of Engineering, Mysuru, Karnataka, India

Keywords:

Titanium (Ti)& Alumina (Al2O3), CCD; Co-Sputtering, Magnetron Sputtering; Analysis of Variance

Abstract

The aim of this article is to study the influence of deposition  parameter on thickness of Titanium (Ti) - Alumina (Al2O3) thin film co-sputtered using magnetron sputtering technique on Stainless Steel grade 304(SS304) and Copper (Cu) substrates. Nanostructured thin film have been sputtered simultaneously from two targets (Ti and Al2O3) by Direct Current (DC) magnetron sputtering and Radio Frequency (RF) magnetron sputtering respectively without substrate heating. Though most engineering cutting tools are primarily manufactured from bulk material, thin film is often required for hardness, its adhesiveness and surface integrity control. This paper presents the result of an analysis of experimental investigation on thickness. The experiments have been carried out based on rotatable Central Composite Design (CCD) of experiments approach. The influence of deposition parameters viz. DCpower, RF Power and inert gas flow rate on thickness has been analyzedstatistically by ANOVA. It is established that DC power and RF power have been linearly significant. Contour plots of thickness have been developed for DC power and RF power.

References

[1]. MotaharehEinollahzadeh-Samadi and Reza SabetDariani , “Characterization of nanocrystalline Ti films deposited by DC magnetron sputtering onto FTO glass substrate” Journal of Materials Research Society , Vol. 30, Oct 28, 2015, pp 3093 -3103
[2]. Douglas C Montgomery “Design and Analysis of Experiments” , fourth edition: Wiley India (P) Ltd
[3]. KaukoLeiviska “Introduction to Experiment Design” University of Oulu ,Control Engineering Laboratory, 2013
[4]. Thomas B Barker “Quality by experimental design”. New York :Marcel DeckkerInc
[5]. Kuehl Robert O. “Design of experiments”USA:Duxbury;2000
[6]. MasahikoNaoe,SatoshiOno, ToyoakiHirata“Crystal orientation in titanium thin films deposited by the sputtering method without plasma damage” Material Science and Engineering: A, Volume 134, 25 March 1991, Pages 1292-1295
[7]. NishatArshi, Junqing Lu, Chan Gyu Lee, Jae Hong Yoon, Bon Heun Koo And Faheem Ahmed “Thickness effect on properties of titanium film deposited by d.c.magnetron sputtering and electron beam evaporation techniques” Bull. Mater. Sci., Vol. 36, No. 5, October 2013, pp. 807–812

Published

2018-09-18

Issue

Vol. 1 No. 1 (2019): Journal of Advanced Research in Nanoscience and Nanotechnology

Section

Research Article

Copyright (c) 2018 Journal of Advanced Research in NanoScience and NanoTechnology

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