Optimization of Reluctance at 1310 Nm in SOI Grating Structure for Planar Light Wave Circuits
Keywords:
SOI, Si-SiC, CMOSAbstract
Now days the top layer silicon is made inform of grating structure for the sake of Planner light wave circuits. The grating structure is consists of alternate layers of two materials, for an example alternate layers of silicon carbide and silicon monoxide. When light incidents on SOI waveguide light propagates through the grating. The efficiency of SOI waveguide depends on the grating structure, which is placed on the top of the insulator. In this research, we discusses about silicon grating SOI Structure. Mathematical analysis is described and simulation results with discussions are made for Si-SiC SOI grating structure.
How to cite this article:
Palai G. Optimization of Reluctance at 1310 Nm in SOI Grating Structure for Planar Light Wave Circuits. J Engr Desg Anal 2020; 3(2): 45-49.
References
Vickerya G, Northcottb J. Diffusion of Microelectronics and Advanced Manufacturing Technology: A Review of National Surveys. Economics of Innovation and New Technology 1995; 3(3&4).
Gettering Defects in Semiconductors; Victor A Perevostchikov. Springer Series in Advanced Microelectronics Industrial chemistry & manufacturing technologies, 21st, 2010.
Asghari M. Proc. Optical Fiber Communication and National Fiber Optic Engineers Conf. (OFC/NFOEC). 2008.
Nishi H, Tsuchizawa T, Watanabe T. Monolithic Integration of a Silica-Based Arrayed Waveguide Grating Filter and Silicon Variable Optical Attenuators Based on pin Carrier-Injection Structure. Sungbong Park. Appl Phys Express 2010.
Ho-Chul Ji, Bulk silicon photonic wire for one-chip integrated optical interconnection. Group IV Photonics (GFP), 2010 7th IEEE International Conference on. 2010; 96-98.
Yu B, Dong H, Qian L et al. Friction-induced nanofabrication on monocrystalline silicon. Bingjun Yu et al. 2009 Nanotechnology 20465303. 2009; 20(46): 5303.
Mcnab SJ. SOI 2D photonic crystals for microphotonic integrated circuits; This paper appears in:Holey Fiber and Photonic Crystals/ Polarization Mode Dispersion/ Photonics Time/ Frequency Measurement and Control, 2003 Digest of the LEOS Summer Topical Meetings Date of Conference: 14-16 July 2003; Page(s): WA2.1/79-WA2.1/80
Palai G, Tripathy SK. Efficient silicon grating for SOI applications; OPTIK-Int. Journal of Light and Electron Optics.
Lockwood DJ, Pavesi L. Silicon Photonics II: Components and Integration, 2011; 2.
Roelkens G, Vermeulen D, Thourhout DV et al. Fédéli, High efficiency diffractive grating couplers for interfacing a single mode optical fiber with a nanophotonic siliconon-insulator waveguide circuit. Appl Phys Lett 2008; 92: 131101-03.
Bogaerts W et al. Silicon-on-insulator based nanophotonics: Why, How, What for? J Light wave Technolo 2005; 23: 401-412.
Dai D, Shi Y, Deeply-etched SiO2 ridge waveguide for sharp bends. IEEE J Lightwave Technol 2006; 24: 5019-5024.
Eggleton BJ, Slusher RE. Non linear photonic crystals, Springer, Newyork. 2003.
Wang J, Jin Y, Shao J et al. Optimization design of an ultra broad band, high-efficiency, all-dielectric grating, Optics Letters. 2010; 35: 187-189.
Tang CK, Kewell AK, Reed GT et al. Namavar, Development of a library of low- loss silicon-on-insulator optoelectronic devices. IEEE Proc., Optoelectron. 1996; 312-315.
Materials-Refractive-index-and-extinction-coefficient: E.F. Schubert. 2004. http://www.rpi.edu/~schubert/Educational- resources/Materials-Refractive-indexand-extinction- coefficient.pdf. 2011.
Liang TK, Tsang HK. Nonlinear absorption and Raman scattering in silicon-on-insulator optical waveguides. 2004; 10: 1149-1153.
Johnson BM, Thomas J. Painter, Oskar Accurate measurement of scattering and absorption loss in microphotonic devices. Optics Letters 2007; 32: 2954-2956.
Zheng Y, Huang Y, Ho S. Effect of Etched Sidewall Tilt on the Reflection Loss of Silicon-on-Insulator (SOI) or III-V Etched Facet Reflector. In Laser Science XXIV, OSA Technical Digest (CD) (Optical Society of America, 2008), JWA78. 2008.
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