Analysis of W-Al2O3 Nanostructured Thin Film Coatings Using DOE Approach

Authors

  • Naveen A Department of Mechanical Engineering, Vidyavardhaka College of Engineering, Mysuru, Karnataka, India, 8884404712
  • L KRISHNA MURTHY Department of Mechanical Engineering, National Institute of Engineering, Mysuru, Karnataka, India.
  • T N SHRIDHAR Department of Mechanical Engineering, National Institute of Engineering, Mysuru, Karnataka, India.

Keywords:

Co-deposition; Magnetron Sputtering; Analysis of Variance; W/Al2O3 coatings

Abstract

This investigation studies the influence of process parameters of magnetic sputtering method in codeposition of Tungsten (W) and Alumina (Al2O3) thin film on stainless steel 304 grade and copper substrates. The developed thickness of thin film is mainly depends on parameters, specifically power supplied to the targets to sputter the atoms, inert gas flow rate and vaccum pressure parameters. The experimental configuration of parameters and number of experiments have been carried out using rotatable Central Composite Design (CCD) technique and regression models have been developed, which provide complete insight of the degree to which thickness depends upon process parameters and analysis of variance on thickness of thin film has been presented.

References

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Published

2018-06-28

Issue

Vol. 5 No. 1&2 (2018): Journal of Advanced Research in Manufacturing, Material Science & Metallurgical Engineering

Section

Research Article